Fw: [Microscopy] NIST/MAS Particle Workshop 2006

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From> ------------------------------------
> NIST/MAS Particle Workshop 2006
> -------------------------------------
>
> The ongoing series of topical workshops sponsored by the National
> Institute of Standards and Technology and the Microbeam Analysis Society
> will continue at NIST’s Gaithersburg campus the 24^th through 26^th of
> April 2006. This workshop will focus on microscopic techniques for
> analyzing particles from millimeter to nanometer size range. The
> techniques discussed will include SEM/EDS, AEM, TOF/SIMS, optical, FIB
> and scanned probe microscopies. The workshop format will bring together
> industrial and government laboratory users with leading researchers.
> Many different industries will be represented including the
> pharmaceutical, mining, environmental, semiconductor, space science,
> nanomaterials, forensics and manufacturing industries. The focus will be
> on discussing current usage and the current state-of-the-art and
> identifying productive demand-driven avenues for future research. There
> is no registration fee however attendance is limited to the first 300
> registrants. Additional information and an online registration form is
> available at http://www.nist.gov/particle. For answers to questions that
> are not addressed by the web site please contact Nicholas Ritchie
> (nicholas.ritchie@nist.gov).
>
>
Received on Mon Sep 26 08:00:12 2005