Fw: [Microscopy] Workshop Announcement - Electron Modeling

Autor: KJ Hübner <hubner_at_iod.krakow.pl>
Data: Tue 17 Aug 2004 - 07:07:58 MET DST
Message-ID: <008401c48418$29acf9a0$051d9c95@iod.krakow.pl>
Content-Type: text/plain; charset="iso-8859-1"

>
> NIST, AVS and MAS will co-sponsor a Workshop on Modeling Electron
Transport
> for Applications in Electron and X-ray Analysis and Metrology at NIST
> (Gaithersburg, Maryland, November 8-10, 2004) to highlight progress and
> determine directions for future development of electron-simulation
> techniques and the needs for electron-interaction data. This Workshop will
> bring together experts in the physical theory and data that support the
> simulation techniques as well as scientists and engineers who develop
> models and obtain results for specific applications. Applications will
> include x-ray microanalysis of particles, rough and layered surfaces,
Auger
> analysis of near-surface features, testing of matrix-correction procedures
> for bulk analysis, metrology of sub-micrometer scale features in SEM
> images, low-voltage and ultra-low-voltage microscopy simulation, radiation
> physics, etc. A planned poster session will include demonstrations of
> relevant software and databases.
>
> Further information on the Workshop can be found at
> http://www.nist.gov/electron. We are now inviting the submission of
> abstracts for the Workshop, the deadline being October 8. Enquiries should
> be directed to dale.newbury@nist.gov
>
>
>
>
Received on Tue Aug 17 08:38:23 2004

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