Royal Microscopical Society
12th International Conference on
MICROSCOPY OF SEMICONDUCTING MATERIALS
25-29 March 2001, University of Oxford, UK
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Final Call for Papers
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This international conference will focus on the latest developments
in the study of the structural and electrical properties of
semiconductors by the application of transmission and scanning
electron microscopy, scanning probe microscopy and X-ray
techniques.
The state-of-the-art in all important subject areas will be
addressed, including the characterisation of bulk and thin film
as-grown materials, the study of lattice defect and impurity
behaviour and the investigation of advanced semiconductor
processing procedures.
Special conference sessions will concentrate on recent
developments in high-resolution imaging and analytical electron
microscopy, advances in SEM and SPM applications, the
characteristics of epitaxial layers (including III-V nitrides),
quantum wells, wires and dots, the effects of device processing
treatments (including, especially, advanced silicon technology) and
metal-semiconductor contacts and silicides. Prominent invited
speakers will introduce each topic area.
The Proceedings of the conference will be published and the final
call for papers has now been issued. Abstracts (deadline 1
DECEMBER 2000) should be submitted by E-mail to:
jenny@rms.org.uk
Full conference information (with the invited speaker listing, etc)
can be found at the conference Web site
http://www.rms.org.uk/currentevents2.htm#MSMXII
The conference Chairmen are Prof Tony Cullis
(a.g.cullis@sheffield.ac.uk) and Dr John Hutchison
(john.hutchison@materials.ox.ac.uk) who may be contacted with
any general enquiries.
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Received on Wed Nov 22 04:24:15 2000
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