ICMCTF-99 Call For Papers -visit the web site for more info (fwd)

Z pozdrowienia dla wszystkich

                  Krzysztof Jan Huebner

<hubner@IOd.krakow.pl> :-)

FOUNDRY RESEARCH INSTITUTE
      Research Materials Department
           Manager Structural and Physical Research Laboratory
str. Zakopianska 73 Call (*48 12) 2665022 ext.356
30-418 KRAKOW - POLAND Fax (+48 12) 2660870

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The Call for Papers for the International Conference on Metallurgical
Coatings and Thin Films -1999 in San Diego is out. Details of the
meeting can be found at the following web site.

http://home.vacuum.org/icmctf/icmctf.html

Of specific interest to physical science researchers on the Microscopy
Listserver is Symposium F. There is an emphasis this year on scanning
probe microscopy techniques. Session F4/B3 concentrates on
Microstructural, Microanalytical and Imaging Characterization of thin
films. I've included the Symposium F and the F4/B3 session synopses
below. Submission of abstract can be done over the Internet.

Symposium F
Coating and Thin Film Characterization
Symposium Chairs:
John T. Grant, Research Institute, University of Dayton, Dayton, OH
45469-0168
Phone: (937)255-6603; Fax: (937)258-8075; e-mail:
grantjt@ml.wpafb.af.mil
Hans J. Steffen, Mannheim University of Applied Sciences, Mannheim,
Germany
Phone: (49)621-292-6543; Fax: (49)621-292-6420; e-mail:
steffen@fh-mannheim.de

http://home.vacuum.org/icmctf/symposium f.html

OBJECTIVES: This symposium focuses on applications and recent advances
in coating and thin film characterization. Moreover, it deals with
progresses in the fundamental understanding of film growth processes and
the elementary structure - properties relations by analytical methods,
especially but not exclusively in the fields of carbide, oxide, nitride,
and DLC coatings. It is the intention of the F symposium to create an
analysis group which works on hard coatings and deposition techniques
for the discussion and exchange of ideas and procedures for the
elucidation of growth processes and mechanisms. These topics are of
particular importance as emerging deposition processes and innovative
processing techniques are employed to produce thin films and coatings
with unique mechanical, chemical, physical, and microstructural
characteristics. Of special interest are analytical and characterization
techniques and methods, including numerical evaluation procedures like
factor analysis etc. to adequately describe these coatings and thin
films during and after the deposition. This symposium also addresses the
unique analytical challenges in the investigation of functionally
gradient, multilayer, nanocrystalline, heterogeneous and composite
coatings. Nondestructive and in situ characterization of all kind of
coatings are also of special interest. Hence, a particular focus will be
on X-ray diffraction analysis.

In 1999, Symposium F will highlight applications of all scanning probe
microscopy techniques (AFM, STM, etc.) and imaging methods. These
techniques have wide applicability for characterizing state of the art
coating materials and thin-film architectures. The session includes
topics covering theory, experiment, and sample preparation. Submissions
are welcome on characterization of: mechanical, chemical, and structural
properties of thin films and coatings such as friction, wear, adherence,
topography, roughness, hardness, phases, and chemical forces.

Invited Speakers: Michael Serry, Digital Instruments,Recent Technologies
and Advances in Thin Film Characterization Using Atomic Force Microscopy
and K. Satori, Sony Corporation, Japan,Surface Roughness Development
During Sputter Depth Profiling of Semiconductor and Metal Thin Films
determined by AFM

F4/B3. Microstructural, Microanalytical and Imaging Characterization.
Session Chairs: Siegfried Hofmann, National Research Institute for
Metals, Japan and Scott D. Walck, PPG Industries.
This joint session solicits papers covering advanced characterization of
the micro- and nano-structure of coatings and thin films. This session
will focus on recent developments in new and established techniques for
microstructural characterization and imaging, with emphasis on surfaces
and interfaces. Methods include but are not limited to high resolution
and analytical TEM, STM/AFM, EPMA, XRD, SEM, grazing X-ray reflectivity
(GXR) and other spatially resolved imaging and elemental mapping
techniques.
Invited Speakers: Isao Kojima, National Institute of Materials and
Chemical Research,High Resolution Thickness and Interface Roughness
Characterization in Multilayer Thin Films by Grazing Incidence X-ray
Reflectivity, Larry F. Allard, Oak Ridge National Laboratory,Materials
Characterization Via the Internet, and Kannan Krishnan, Lawrence
Berkeley National Laboratory,Magnetism and Microstructures in Thin
Films, Multilayers and Nanostructures.
Received on Wed Aug 12 08:54:52 1998